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Debra Vogler

Recent Posts

Meeting Metrology and Inspection Requirements as EUVL Ramps Up for 5nm and 3nm

The Advanced Lithography TechXPOT at this year’s SEMICON West will explore progress in extreme ultraviolet lithography (EUVL), its economic viability for high-volume manufacturing (HVM) and other lithography solutions that will address the march...

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Metrology and Inspection Challenges at 5nm and Beyond

The Scaling Technologies TechXPOT at this year’s SEMICON West (Scaling Every Which Way! – Thursday, July 12, 2:00pm-4:00pm) will explore traditional scaling as the industry marches toward 3nm and beyond, as well as technologies that enable 3D...

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Directed Self Assembly (DSA) Plays Role in the March to 3nm

The Advanced Lithography TechXPOT at this year’s SEMICON West will explore progress in extreme ultraviolet lithography (EUVL), its economic viability for high-volume manufacturing (HVM) and other lithography solutions that will address the march...

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Getting to 3nm: It Really is Scaling Every Which Way!

With chipmakers looking toward 5nm manufacturing, it’s clear that traditional scaling is not dead but continuing in combination with other technologies. The industry sees scaling enabled by 3D architectures such as die stacking and the stacking...

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EUV Lithography: Extending the Patterning Roadmap to 3nm

This year’s Advanced Lithography TechXPOT at SEMICON West will explore the progress on extreme ultra-violet lithography (EUVL) and its economic viability for high-volume manufacturing (HVM), as well as other lithography solutions that can address...

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